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Published April 1, 2020 | Version v1
Journal article

Characteristics and techniques of GaN-based micro-LEDs for application in next-generation display

  • 1. Institute for Electric Light Sources, School of Information Science and Technology, Engineering Research Center of Advanced Lighting Technology, and Academy of Engineering and Technology, Fudan University, Shanghai 200433 (China)

Description

Due to the excellent optoelectronic properties, fast response time, outstanding power efficiency and high stability, micro-LED plays an increasingly important role in the new generation of display technology compared with LCD and OLED display. This paper mainly introduces the preparation methods of the GaN-based micro-LED array, the optoelectronic characteristics, and several key technologies to achieve full-color display, such as transfer printing, color conversion by quantum dot and local strain engineering. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/41/4/041606

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
41
Journal Issue
4
Journal Page Range
[6 p.]
ISSN
1674-4926

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54020594
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
GALLIUM NITRIDES; LIGHT EMITTING DIODES; QUANTUM DOTS
Descriptors DEC
GALLIUM COMPOUNDS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES