Published April 1, 2020
| Version v1
Journal article
Characteristics and techniques of GaN-based micro-LEDs for application in next-generation display
Creators
- 1. Institute for Electric Light Sources, School of Information Science and Technology, Engineering Research Center of Advanced Lighting Technology, and Academy of Engineering and Technology, Fudan University, Shanghai 200433 (China)
Description
Due to the excellent optoelectronic properties, fast response time, outstanding power efficiency and high stability, micro-LED plays an increasingly important role in the new generation of display technology compared with LCD and OLED display. This paper mainly introduces the preparation methods of the GaN-based micro-LED array, the optoelectronic characteristics, and several key technologies to achieve full-color display, such as transfer printing, color conversion by quantum dot and local strain engineering. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/41/4/041606Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 41
- Journal Issue
- 4
- Journal Page Range
- [6 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54020594
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- GALLIUM NITRIDES; LIGHT EMITTING DIODES; QUANTUM DOTS
- Descriptors DEC
- GALLIUM COMPOUNDS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES