Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

In this paper, the characterization of thin films, deposited with the precursor ferrocene (FcH) by the plasma enhanced chemical vapour deposition (PECVD) technique, was investigated. The films were measured by Scanning Electronic Microscopy (SEM), Atomic Force Microscopy (AFM), Electron Spectroscopy for Chemical Analysis (ESCA), and Superconducting Quantum Interference Device (SQUID). It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks. The surface roughness is about 36 nm. From the results of ESCA, it can be inferred that the film mainly contains the compound FeOOH, and carbon is combined with oxygen in different forms under different supply-powers. The hysteresis loops indicate that the film is of soft magnetism