Published November 2008 | Version v1
Journal article

Diffusion anisotropy and void development under cascade irradiation

  • 1. Russian Academy of Sciences, Institute for Nuclear Research, Moscow (Russian Federation)
  • 2. The Hong Kong Polytechnic University, Department of Electronic and Information Engineering, Kowloon, Hong Kong SAR (China)
  • 3. Universitaet Stuttgart, Institut fuer Theoretische und Angewandte Physik, Stuttgart (Germany)
  • 4. Max-Planck-Institut fuer Metallforschung, Stuttgart (Germany)

Description

Cascade irradiation of metals gives rise to swelling as a result of the creation of voids and the evolution of the void ensemble. Under suitable circumstances, the originally disordered void distribution transforms into to a void lattice. As demonstrated previously, the understanding of the evolution and the unique features of the void ensemble requires a difference in the anisotropy of the diffusion (DAD) of vacancies and self-interstitial atoms (SIAs), which is achieved by one-dimensional diffusion of the SIAs. On the other hand, void swelling has been successfully modeled in terms of three-dimensional diffusion of both vacancies and SIAs. In the present paper it is shown that these seemingly contradicting interpretations and all related observations can be quantitatively reconciled by a small DAD created by only ∝1% of SIAs diffusing one-dimensionally. It is also demonstrated that at the initial stage of void-lattice formation, ordering occurs mainly on close-packed crystal planes, which is in contrast to the naive expectation that one-dimensional diffusion of SIAs should result in a void ordering along close-packed directions. Finally it is found that, in the case of a small DAD, voids annihilate via stochastic shrinkage much faster than by coalescence. This falsifies the argument in the literature that one-dimensional diffusion of SIAs would necessarily lead to the coalescence of voids and destabilization of the void lattice. (orig.)

Availability note (English)

Available from: http://dx.doi.org/10.1007/s00339-008-4832-4

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics. A, Materials Science and Processing
Journal Volume
93
Journal Issue
2
Series
Special issue: Elementary processes in molecular switches at surfaces
Journal Page Range
p. 365-377
ISSN
0947-8396
CODEN
APAMFC