Published April 2006
| Version v1
Journal article
Diffusion study of 18O implanted into α-Hf using the nuclear resonance technique
- 1. Instituto de Fisica-UFRGS, Caixa Postal 15051, Porto Alegre, RS (Brazil)
- 2. Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), Buenos Aires (Argentina)
Description
The diffusion of 18O in α-Hf was studied in the 723-923 K temperature range by using ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follows an Arrhenius behavior D(T)=D0e(-Q/RT), where D0=(5±3) x 10-9 m2s-1 and Q=162±5 kJ/mol. A comparison of the present results with previous ones is also done. (orig.)
Availability note (English)
Available from: http://dx.doi.org/10.1007/s00339-005-3471-2Additional details
Identifiers
Publishing Information
- Journal Title
- Applied Physics. A, Materials Science and Processing
- Journal Volume
- 83
- Journal Issue
- 1
- Journal Page Range
- p. 37-40
- ISSN
- 0947-8396
- CODEN
- APAMFC
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 37038847
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ARRHENIUS EQUATION; DIFFUSION; EXPERIMENTAL DATA; HAFNIUM; ION IMPLANTATION; OXYGEN 18; OXYGEN IONS; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K
- Descriptors DEC
- CHARGED PARTICLES; DATA; ELEMENTS; EQUATIONS; EVEN-EVEN NUCLEI; INFORMATION; IONS; ISOTOPES; LIGHT NUCLEI; METALS; NUCLEI; NUMERICAL DATA; OXYGEN ISOTOPES; REFRACTORY METALS; STABLE ISOTOPES; TEMPERATURE RANGE; TRANSITION ELEMENTS