Published May 15, 1991 | Version v1
Journal article

CO2-laser-induced chemical vapour deposition of TiB2

  • 1. Lab. for Physical Chemistry, Univ. of Amsterdam (Netherlands)
  • 2. LAICA LTV, Amsterdam (Netherlands)

Description

Titanium diboride (TiB2) was photothermally deposited by the reduction of TiCl4 and BCl3. A CO2 laser was the only source of activation. A temperature feedback system was developed to increase the control of the CO2-laser-induced chemical vapour deposition (LCVD) process. In the LCVD process, powder production is prevented and high growth are obtained. The deposition process, which was optimized with respect to the growth rate, resulted in very hard TiB2 coatings (VHN25>300kg mm-2). (orig.)

Additional details

Publishing Information

Journal Title
Surface and Coatings Technology
Journal Volume
45
Journal Issue
1-3
Series
Surf. Coat. Technol.
Journal Page Range
105-113
ISSN
0257-8972
CODEN
SCTEE

Conference

Title
Symposium D on metallurgical coatings and materials surface modifications in conjunction with the spring meeting of the European Materials Research Society (E-MRS).
Dates
29 May - 1 Jun 1990.
Place
Strasbourg (France).