Magnetotransport phenomena in Bi2Se3 thin film topological insulators grown by hybrid physical chemical vapor deposition
- 1. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)
- 2. Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
Description
Intrinsic defects in Bi2Se3 topological insulators tend to produce a high carrier concentration and current leakage through the bulk material. Bi2Se3 thin films were grown by hybrid physical chemical vapor deposition on (0001) Al2O3 substrates with high Se vapor pressure to reduce the occurrence of Se vacancies as the main type of defect. Consequently, the carrier concentration was reduced to ∼5.75 × 1018 cm−3 comparable to reported carrier concentration in Bi2Se3 thin films. Magnetotransport measurements were performed on the films and the data were analyzed for weak anti-localization using the Hikami-Larkin-Nagaoka model. The estimated α and lϕ values showed good agreement with the symplectic case of 2-D transport of topological surface states in the quantum diffusion regime. The temperature and angular dependence of magnetoresistance indicate a large contribution of the 2-D surface carriers to overall transport properties of Bi2Se3 thin film
Additional details
Identifiers
- DOI
- 10.1063/1.4907802;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 117
- Journal Issue
- 6
- Journal Page Range
- p. 065302-065302.6
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46118976
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM OXIDES; BISMUTH SELENIDES; CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; COMPARATIVE EVALUATIONS; CONCENTRATION RATIO; DIFFUSION; LEAKAGE CURRENT; MAGNETORESISTANCE; SUBSTRATES; SURFACES; THIN FILMS; TOPOLOGY; VACANCIES; VAPOR PRESSURE
- Descriptors DEC
- ALUMINIUM COMPOUNDS; BISMUTH COMPOUNDS; CHALCOGENIDES; CHEMICAL COATING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CURRENTS; DEPOSITION; DIMENSIONLESS NUMBERS; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRICAL PROPERTIES; EVALUATION; FILMS; MATHEMATICS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; POINT DEFECTS; SELENIDES; SELENIUM COMPOUNDS; SURFACE COATING; THERMODYNAMIC PROPERTIES
Optional Information
- Notes
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