Published November 2021 | Version v1
Journal article

Improved luminescence and afterglow emission from Mn2+/Si4+ co-doped AlN by combustion synthesis method

  • 1. State Key Laboratory of New Ceramics & Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)
  • 2. Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Department of Physics, Renmin University of China, Beijing 100872 (China)
  • 3. Foshan (Southern China) Institute for New Materials, Foshan, Guangdong 528000 (China)
  • 4. Department of Inorganic Nonmetallic Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 (China)

Description

Highlights: • A Mn2+/Si4+ co-doped strategy was used to improve both luminescence and afterglow properties of the orange-red AlN phosphor by combustion synthesis. • The mechanisms behind this promotion were discussed in detail. • A more reasonable identification of the excitation spectral term of AlN:Mn2+ is proposed. • The effect of Si4+ on the morphology of as-synthesized AlN:Mn2+ phosphors was observed. -- Abstract: An orange-red emitting Mn2+/Si4+ co-doped AlN phosphor was prepared by an efficient combustion synthesis method. Phase identification and structure characterization were performed using powder X-ray diffraction (XRD) and refined by the Rietveld method. Luminescence and afterglow properties of the AlN-based phosphors such as photoluminescence spectra (PL), CIE values, afterglow decay curves, thermoluminescence glow curves (TL) were systematically studied. Using the Tanabe-Sugano diagram, the Racah parameters B, C, and crystal field splitting parameter Dq of as-prepared phosphor were calculated to be 812 cm−1, 2168 cm−1, and 780 cm−1, respectively. The luminescence intensity and afterglow time were increased, respectively, by about 1.1 and 2.2 times after 3% Si4+ co-doping. Particular attention was paid to study the mechanism of Si4+ co-doping on improving luminescence properties using a combination of the above-mentioned method and X-ray photoelectron spectroscope (XPS). Two hypothetical stress cancellation and charge rebalance effects due to Si4+ co-doping were discussed. Besides, it was found a shallower trap level (0.56 eV, compared to 0.84 eV for those without Si4+ co-doping) was formed after the co-doping of Si4+, which results in enhanced afterglow performance.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2021.160745;
PII
S092583882102154X;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
883
Journal Page Range
vp.
ISSN
0925-8388
CODEN
JALCEU

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Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.