Published November 2010 | Version v1
Journal article

Effect of ammonium molybdate concentration on chemical mechanical polishing of glass substrate

  • 1. State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)

Description

The effect of the ammonium molybdate concentration on the material removal rate (MRR) and surface quality in the preliminary chemical mechanical polishing (CMP) of a rough glass substrate was investigated using a silica-based slurry. Experimental results reveal that the ammonium molybdate concentration has a strong influence on the CMP behaviors of glass substrates. When the ammonium molybdate was added to the baseline slurry, polishing rates increased, and then decreased with a transition at 2 wt.%, and the root mean square (RMS) roughness decreased with increasing ammonium molybdate concentration up to 2 wt.%, after which it increased linearly up to 4 wt.%. The improvement in MRR and RMS roughness may be attributed to the complexation of hydrolysis products of the glass substrate with the ammonium molybdate so as to prevent their redeposition onto the substrate surface. It was found that there exists an optimal ammonium molybdate concentration at 2 wt.% for obtaining the highest MRR and the lowest RMS roughness within a particular polishing time.

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/31/11/116003

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
31
Journal Issue
11
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43013341
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
GLASS; HYDROLYSIS; MECHANICAL POLISHING; MOLYBDATES; ROUGHNESS; SLURRIES; SUBSTRATES; SURFACES
Descriptors DEC
CHEMICAL REACTIONS; DECOMPOSITION; DISPERSIONS; LYSIS; MIXTURES; MOLYBDENUM COMPOUNDS; OXYGEN COMPOUNDS; POLISHING; REFRACTORY METAL COMPOUNDS; SOLVOLYSIS; SURFACE FINISHING; SURFACE PROPERTIES; SUSPENSIONS; TRANSITION ELEMENT COMPOUNDS