Published March 1, 2009
| Version v1
Journal article
The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films
Creators
- 1. Department of Physics, School of Science, Beihang University, Beijing, China 100191 (China)
Description
The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400 deg. C, but the mechanical properties became worse when annealing at 6000C.
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/152/1/012016Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 152
- Journal Issue
- 1
- Journal Page Range
- [6 p.]
- ISSN
- 1742-6596
Conference
- Title
- MRS international materials research conference - Symposia D, E and F
- Dates
- 9-12 Jun 2008
- Place
- Chongqing (China)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41058113
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALS; HARDNESS; HYDROGENATION; NANOSTRUCTURES; RAMAN SPECTRA; SILICON; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL COATING; CHEMICAL REACTIONS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELEMENTS; FILMS; HEAT TREATMENTS; MECHANICAL PROPERTIES; SCATTERING; SEMIMETALS; SPECTRA; SURFACE COATING; TEMPERATURE RANGE