Published 2011 | Version v1
Book

The study on the surface erosion of zircaloy material during laser ablation process by thin layer activation technique

  • 1. Analytical Chemistry Division, Variable Energy Cyclotron Centre, Bhabha Atomic Research Centre, Kolkata (India)
  • 2. Analytical Chemistry Division, Bhabha Atomic Research Centre, Mumbai (India)
  • 3. Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai (India)
  • 4. Beam Technology Development Group, Bhabha Atomic Research Centre, Mumbai (India)

Description

Thin layer activation (TLA) technique is a nuclear technique based on the production of a thin layer of activity in the surface by charged particle induced nuclear reaction using high energy ion beam from an accelerator to measure the thickness of loss of materials from the surface in the micrometer range. The technique has been applied to study the loss of material by surface erosion during the laser ablation process. (author)

Part of:
Proceedings of DAE-BRNS symposium on nuclear and radiochemistry. V. 1

Additional details

Publishing Information

Publisher
Bhabha Atomic Research Centre
Imprint Place
Mumbai (India)
Imprint Title
Proceedings of DAE-BRNS symposium on nuclear and radiochemistry. V. 1
Imprint Pagination
427 p.
Journal Page Range
p. 214-215

Conference

Title
10. symposium on nuclear and radiochemistry
Acronym
NUCAR 2011
Dates
22-26 Feb 2011
Place
Visakhapatnam (India)

Optional Information

Notes
3 refs., 2 figs., 1 tab.