Corrosion behavior of magnetron sputter-deposited (Mo /sub 0.6/ Ru /sub 0.4/ )82B18 and Mo82B18 amorphous metal films
- 1. Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California
Description
Amorphous metallic films of Mo49Ru33B18 and Mo82B18 have been prepared by magnetron sputtering, and their corrosion behavior was investigated and compared with amorphous liquid-quenched Mo49Ru33B18 an crystalline Mo in acidic and basic solutions. Sputtered Mo49Ru33B18 showed lower corrosion rates compared with liquid-quenched Mo49Ru33B18, owing to the superior surface smoothness and uniformity of the former. Amorphous Mo82B18 showed low corrosion rates in both acidic and basic aqueous solutions. Comparison of the corrosion properties of Mo49Ru33B18 with Mo82B18 and Mo demonstrates the roles of the alloys' constituents. Ru significantly extends the passive region to high anodic potentials, but, at less anodic potentials, Mo82B18 has the lowest corrosion rate
Additional details
Publishing Information
- Journal Title
- J. Electrochem. Soc.
- Journal Volume
- 131
- Journal Issue
- 12
- Series
- J. Electrochem. Soc.
- Journal Page Range
- 2791-2794
- ISSN
- 0013-4651
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 16084318
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; ANODES; BORON ALLOYS; CHEMICAL PREPARATION; CHEMICAL PROPERTIES; CHEMICAL REACTION KINETICS; CORROSION; DEPOSITION; ELECTRIC BATTERIES; FABRICATION; MAGNETRONS; METALLIC GLASSES; MOLYBDENUM ALLOYS; QUENCHING; RUTHENIUM ALLOYS; SPUTTERING; THIN FILMS
- Descriptors DEC
- ALLOYS; CHEMICAL REACTIONS; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY STORAGE SYSTEMS; EQUIPMENT; FILMS; HEAT TREATMENTS; KINETICS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; REACTION KINETICS; SYNTHESIS