Published September 16, 2013 | Version v1
Journal article

Study of microstructure and magnetization reversal mechanism in granular CoCrPt:SiO2 films of variable thickness

  • 1. Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche, Area della Ricerca Roma1, 00015 Monterotondo Scalo, Roma (Italy)
  • 2. Institute of Physics, Chemnitz University of Technology, D-09107 Chemnitz (Germany)
  • 3. Dipartimento di Fisica, Università di Bologna and CNISM, I-40127 Bologna (Italy)
  • 4. Dipartimento SIMAU, Università Politecnica delle Marche, 60131 Ancona (Italy)

Description

The effect of the thickness and microstructural features on the switching behaviour of granular CoCrPt:SiO2 films with perpendicular magnetic anisotropy was investigated. TEM plane view and cross section analysis indicate that, while the very first layers grow as uniform nanograins in close contact, the growth proceeds by formation of well-defined CoCrPt columnar islands (7 nm average size) separated by the silicon oxide, the distance among the islands remaining roughly constant along the whole thickness. The relation between such non-uniform microstructure and the magnetization reversal mechanism at room temperature was investigated by performing hysteresis loops at variable angle as well as time dependent measurements by using a vector vibrating sample magnetometer. Numerical micromagnetic simulations of the hysteresis loops have been carried out to support the description of the experimental observations. The results showed a coexistence of coherent and incoherent reversal processes, the former being more and more pronounced with increasing the magnetic layer thickness, consistently with the microstructural investigations. - Highlights: • Granular CoCrPt/SiO2 films with different thickness were deposited by magnetron sputtering. • Microstructural properties were found to change with increasing thickness. • The magnetization reversal mechanism was investigated at room temperature. • The importance of coherent magnetization reversal processes increases with increasing the magnetic layer thickness. • The results were confirmed by numerical micromagnetic simulations

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2013.06.005

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2013.06.005;
PII
S0254-0584(13)00461-6;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
141
Journal Issue
2-3
Journal Page Range
p. 790-796
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.