Tl10Hg3Cl16: Single crystal growth, electronic structure and piezoelectric properties
Creators
- 1. Frantsevych Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, 3 Krzhyzhanivsky Street, 03142 Kyiv (Ukraine)
- 2. Institute of Physics, J.Dlugosz University Częstochowa, Armii Krajowej 13/15, Częstochowa PL-42-217 (Poland)
- 3. Electrical Engineering Department, Częstochowa University Technology, Armii Krajowej 17, PL-42-200 Częstochowa (Poland)
- 4. Department of Inorganic and Organic Chemistry, Lviv National University of Veterinary Medicine and Biotechnologies, 50 Pekarska Street, 79010 Lviv (Ukraine)
- 5. Yuriy Fed'kovych Chernivtsi National University, 2 Kotziubynskoho Street, 58012 Chernivtsi (Ukraine)
- 6. Department of Inorganic and Physical Chemistry, Lesya Ukrainka Eastern European National University, 13 Voli Avenue, 43025 Lutsk (Ukraine)
Description
Single crystal of the ternary halide Tl10Hg3Cl16 was grown using Bridgman-Stockbarger method. For the Tl10Hg3Cl16 crystal, we have measured X-ray photoelectron spectra for both pristine and Ar+ ion-bombarded surfaces and additionally investigated photoinduced piezoelectricity. Our data indicate that the Tl10Hg3Cl16 single crystal surface is very sensitive with respect to Ar+ ion-bombardment. In particular, Ar+ ion-bombardment with energy of 3.0 keV over 5 min at an ion current density of 14 μA/cm2 causes significant changes of the elemental stoichiometry of the Tl10Hg3Cl16 surface resulting in an abrupt decrease of the mercury content in the top surface layers of the studied single crystal. As a result of the treatment, the mercury content becomes nil in the top surface layers. In addition, the present XPS measurements allow for concluding about very low hygroscopicity of the Tl10Hg3Cl16 single crystal surface. The property is extremely important for the crystal handling in optoelectronic or nano-electronic devices working at ambient conditions. The photoinduced piezoelectricity has been explored for Tl10Hg3Cl16 depending on nitrogen (λ=371 nm) laser power density and temperature. - Graphical abstract: As-grown single crystal boule of Tl10Hg3Cl16; dependence of the effective piezoelecric coefficient d33 versus the photoinducing nitrogen laser power density, I, at different temperatures, T; and packing of the polyhedra of halide atoms around Hg atoms in the Tl10Hg3Cl16 structure. - Highlights: • High-quality Tl10Hg3Cl16 single crystal has been grown by Bridgman-Stockbarger method. • Electronic structure of Tl10Hg3Cl16 is studied by the XPS method. • Tl10Hg3Cl16 single crystal surface is sensitive with respect to Ar+ ion-bombardment. • Very low hygroscopicity is characteristic of the Tl10Hg3Cl16 surface. • Photoinduced piezoelectricity is studied for the Tl10Hg3Cl16 compound.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jssc.2016.07.012Additional details
Identifiers
- DOI
- 10.1016/j.jssc.2016.07.012;
- PII
- S0022-4596(16)30270-5;
Publishing Information
- Journal Title
- Journal of Solid State Chemistry
- Journal Volume
- 242
- Journal Issue
- Part 1
- Journal Page Range
- p. 193-198
- ISSN
- 0022-4596
- CODEN
- JSSCBI
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49003147
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ARGON IONS; CHLORINE COMPLEXES; CRYSTAL GROWTH; CURRENT DENSITY; ELECTRONIC STRUCTURE; EXPERIMENTAL DATA; ION BEAMS; KEV RANGE 01-10; MERCURY COMPLEXES; MONOCRYSTALS; PIEZOELECTRICITY; POWER DENSITY; SURFACES; TELLURIUM COMPLEXES; X RADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; COMPLEXES; CRYSTALS; DATA; ELECTRICITY; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ENERGY RANGE; INFORMATION; IONIZING RADIATIONS; IONS; KEV RANGE; NUMERICAL DATA; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.