Published June 2014 | Version v1
Journal article

Bulk AlN growth by physical vapour transport

  • 1. Leibniz Institute for Crystal Growth (IKZ) Max-Born-Str. 2, D-12489 Berlin (Germany)

Description

The process technologies of AlN growth by physical vapour transport are reviewed in this paper with a focus on the growth parameters, crucible materials, and the type of seeding/nucleation. In this context the three growth strategies for the first generation of AlN seeds, (i) grain selection, (ii) heteroepitaxially seeding on SiC, and (iii) spontaneous nucleation, are evaluated regarding their impact on the structural properties and the sizes of the grown AlN crystals. Major issues for subsequent homoepitaxial growth runs with controlled diameter enlargement, such as thermal field design and seed fixation, are addressed. Furthermore, the influences of the growth conditions on the main optical absorption bands in AlN are discussed. (invited article)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/29/8/084002

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
29
Journal Issue
8
Journal Page Range
[10 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46083415
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ABSORPTION; ABSORPTION SPECTRA; ALUMINIUM NITRIDES; CRYSTAL GROWTH; NUCLEATION; SILICON CARBIDES; VAPORS
Descriptors DEC
ALUMINIUM COMPOUNDS; CARBIDES; CARBON COMPOUNDS; FLUIDS; GASES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS; SORPTION; SPECTRA