Bulk AlN growth by physical vapour transport
- 1. Leibniz Institute for Crystal Growth (IKZ) Max-Born-Str. 2, D-12489 Berlin (Germany)
Description
The process technologies of AlN growth by physical vapour transport are reviewed in this paper with a focus on the growth parameters, crucible materials, and the type of seeding/nucleation. In this context the three growth strategies for the first generation of AlN seeds, (i) grain selection, (ii) heteroepitaxially seeding on SiC, and (iii) spontaneous nucleation, are evaluated regarding their impact on the structural properties and the sizes of the grown AlN crystals. Major issues for subsequent homoepitaxial growth runs with controlled diameter enlargement, such as thermal field design and seed fixation, are addressed. Furthermore, the influences of the growth conditions on the main optical absorption bands in AlN are discussed. (invited article)
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/29/8/084002Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 29
- Journal Issue
- 8
- Journal Page Range
- [10 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46083415
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION; ABSORPTION SPECTRA; ALUMINIUM NITRIDES; CRYSTAL GROWTH; NUCLEATION; SILICON CARBIDES; VAPORS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CARBIDES; CARBON COMPOUNDS; FLUIDS; GASES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS; SORPTION; SPECTRA