Published October 1990
| Version v1
Report
Generation and focusing of carbon ion beam by the 'Inverse Pinch Ion Diode'
- 1. Himeji Inst. of Tech., Hyogo (Japan)
Description
Focusing of intense ion beams has been attained with the 'Inverse Pinch Ion Diode' which has a flat anode. The energy of the ion beam was 180 keV. At the focal point, the ion current density of 0.5 kA/cm2 has been obtained and the focusing radius of the ion beam (FWHM) is 10 mm. Focusing of the ion beam is due to the electrostatic field in the 'Inverse Pinch Ion Diode'. (author)
Additional details
Publishing Information
- Imprint Title
- Symposium on development of intense pulsed particle beams and its applications
- Imprint Pagination
- 128 p.
- Journal Page Range
- p. 79-88.
- Report number
- NIFS-PROC--5
Conference
- Title
- Symposium on development of intense pulsed particle beams and its applications.
- Dates
- 20 Feb 1990.
- Place
- Nagoya (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 22082336
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM NEUTRALIZATION; CARBON; CARBON 12 BEAMS; DIODE TUBES; FOCUSING; HIGH-VOLTAGE PULSE GENERATORS; INERTIAL CONFINEMENT; ION BEAM FUSION REACTORS; ION SOURCES; MAGNETIC INSULATION; PARTICLE BEAMS; PLASMA PRODUCTION
- Descriptors DEC
- BEAMS; CONFINEMENT; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FUNCTION GENERATORS; ION BEAMS; NONMETALS; PLASMA CONFINEMENT; PULSE GENERATORS; THERMONUCLEAR REACTORS