Published August 1, 2021 | Version v1
Journal article

Critical layer thickness of wurtzite heterostructures with arbitrary pairs of growth planes and slip systems

  • 1. Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510 (Japan)

Description

We establish a calculation method to determine the critical layer thickness of the lattice relaxation in wurtzite heterostructures with arbitrary pairs of growth planes and slip systems. The calculation, which is based on the force balance model, takes the friction force and thermal assistance for the dislocation motion into account. Experimentally, AlxGa1 − xN/AlN heterostructures are fabricated. The established method well reproduces the crystallographic orientations of experimentally observed dislocation lines. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6641/ac0d95

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
36
Journal Issue
8
Journal Page Range
[14 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53056088
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ALUMINIUM NITRIDES; CALCULATION METHODS; CRYSTALLOGRAPHY; DISLOCATIONS; FRICTION; LAYERS; RELAXATION; SLIP
Descriptors DEC
ALUMINIUM COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; LINE DEFECTS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES