Published February 8, 1984 | Version v1
Patent Metadata-only

Method for producing cantilever distance masks

Creators

Description

Subject of the invention is a method for producing a cantilever distance mask of a particle beam projection system to be used in particular for selective structuring and/or doping in the fabrication of highly integrated circuits

Availability note (English)

Available from BUCHEXPORT, DDR-7010 Leipzig.

Additional details

Additional titles

Original title (German)
Verfahren zum Herstellen einer freitragenden Abstandsmaske

Publishing Information

Imprint Pagination
vp.
IPC:
Int. Cl. H01l21/308; H01l21/263; H01l21/312; H01j37/30; C25d1/08.
IPC
Int. Cl. H01l21/308; H01l21/263; H01l21/312; H01j37/30; C25d1/08.
Patent number
DD patent document 206924/B/

INIS

Country of Publication
German Democratic Republic
Country of Input or Organization
German Democratic Republic
INIS RN
15039006
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
CRYSTAL DOPING; INTEGRATED CIRCUITS; ION BEAMS; ION IMPLANTATION; SPUTTERING
Descriptors DEC
BEAMS; ELECTRONIC CIRCUITS