Electromagnetic measuring data processing device

A function for calculating a calculation processing coefficient of a periodical calculating processing in parallel with a previous period is added. In addition, there is disposed a function for dividing a calculation processing in one period and processing inputted data successively at a plurality of calculation processing portions. Further, there is disposed a function for calculating a coefficient suitable to a calculation processing for a next period based on the intermediate result of the calculation of the previous period. When the measuring errors of each of the data are taken into consideration, there is disposed a function for estimating the measuring errors of the next period based on the previous period. When electromagnetic measuring data are processed based on distribution forms of current such as plasma current, coil current, and structural eddy current, a current distribution form as a result of the previous period is used as a model for the calculation of plasma position and the shape of the next period. Since plasma position and the shape can be calculated tracing plasma fluctuations, accuracy can be kept constant. When it is used for an actual time monitor, processing period can be shortened substantially to 1/2. (N.H.)