The improvement of ion beam uniformity of 300mm bucket type ion source for in-line etching process

To apply to in-line etching process of the steel industry, it is required high etching rate and over 1000 mm of extraction ion beam size. So we developed prototype bucket ion sources for the high rate etching and the increase in ion source life time for in-line type mass production. And we are developed the bucket type Ion source of 300mm ion beam width for large area etching. For large-area ion source, the control of the uniformity of the ion beam is very important. Detailed experimental results will be presented. We successfully extracted max 400mm ion beam width using the 300mm bucket type ion source. We are studied the optimum process condition for wide beam extraction and wide rage uniformity over 200mm. 90% uniformity, it was confirmed that it is a beam width of about 200mm by evaluating the uniformity test of the beam width 300mm Bucket type ion source. Further, via the power adjustment of the filament was significantly improved uniformity of large-area beam