Published May 2012
| Version v1
Journal article
Effect of the metal work function on the electrical properties of carbon nanotube network transistors
- 1. Samsung Advanced Institute of Technology, Yongin (Korea, Republic of)
- 2. Hanyang University, Seoul (Korea, Republic of)
Description
A nearly perfect semiconducting single-walled carbon nanotube random network thin film transistor array was fabricated, and its reproducible transport properties were investigated. The effects of the metal work function for both the source and the drain on the electrical properties of the transistors were systematically investigated. Three different metal electrodes, Al, Ti, and Pd, were employed. As the metal work function increased, p-type behavior became dominant, and the field effect hole mobility dramatically increased. Also, the Schottky barrier of the Ti-nanotube contact was invariant to the molecular adsorption of species in air.
Additional details
Publishing Information
- Journal Title
- Journal of the Korean Physical Society
- Journal Volume
- 60
- Journal Issue
- 10
- Series
- 21 refs, 5 figs, 1 tab
- Journal Page Range
- p. 1680-1684
- ISSN
- 0374-4884
INIS
- Country of Publication
- Korea, Republic of
- Country of Input or Organization
- Korea, Republic of
- INIS RN
- 45069475
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CARBON; CHARGE TRANSPORT; ELECTRICAL PROPERTIES; NANOSTRUCTURES; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR MATERIALS; TITANIUM; TRANSISTORS; WORK FUNCTIONS
- Descriptors DEC
- ELEMENTS; FUNCTIONS; MATERIALS; METALS; NONMETALS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; TRANSITION ELEMENTS