Published August 3, 2004 | Version v1
Journal article

Comparison of corrosion behavior of zirconium bombarded with self-ion and molybdenum ion

Description

In order to study the effects of zirconium and molybdenum ion bombardment on the aqueous corrosion behavior of zirconium, one group of specimens was implanted with zirconium ions with ions surface densities ranging from 1 x 1015 to 2 x 1017 ions/cm2 at about 170 deg. C, using a metal vapor vacuum arc (MEVVA) source operated at an extraction voltage of 50 kV. The other group of specimens was bombarded with molybdenum ion with ions surface densities ranging from 1 x 1016 to 5 x 1017 ions/cm2 at about 160 deg. C, using a MEVVA source operated at an extraction voltage of 40 kV. The valence states and depth distribution of elements in the surface of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Polarization curves measurement was employed to evaluate the aqueous corrosion resistance of the zirconium samples in a 1N H2SO4 solution. It was found that the aqueous corrosion resistance of zirconium implanted with 5 x 1016 Zr ions/cm2 is the best in first group samples. For molybdenum ion implantation, the aqueous corrosion resistance of samples declined with raising ions surface densities. The natural corrosion potentials of zirconium samples bombarded with self-ions are more negative than that of the as-received zirconium. While, as for molybdenum ion implantation, the results are opposite. Finally, the mechanisms of the corrosion behavior of the zirconium samples implanted with zirconium and molybdenum ions are discussed

Additional details

Identifiers

DOI
10.1016/j.materresbull.2004.04.027;
PII
S0025540804001266;

Publishing Information

Journal Title
Materials Research Bulletin
Journal Volume
39
Journal Issue
10
Journal Page Range
p. 1417-1429
ISSN
0025-5408
CODEN
MRBUAC

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.