X-ray fluorescence analysis using theoretical intensity of scattered X-rays

We investigated a method for calculating the theoretical intensity of the scattered X-rays that are detected simultaneously with the fluorescence X-rays during X-ray fluorescence analysis. In addition, we evaluated the calculation method by investigating whether a constant correlation exists with the measured intensity. The scattered X-ray monitor method using the intensity ratio of the fluorescence and scattered X-rays is employed with the working curve method for absorption and-or enhancement correction between elements. We used theoretical intensity calculations to prove the validity of this scattered X-ray monitor method. Next, we measured thickness of a resin film as an application example of the theoretical intensity of scattered X-rays. We demonstrated that the gross intensity can be calculated at any wavelength or energy position in addition to the theoretical intensity of the fluorescence X-rays. Finally, we applied the scattered X-ray monitor method to the new fundamental parameter analysis method, and conducted analysis on resins to prove the validity of the method. (author)