Published August 15, 1986
| Version v1
Journal article
Effect of static charge on the infrared spectrum of amorphous silicon
- 1. Department of Physics, University of California, Davis, California 95616
Description
Using first-principles electronic and lattice-dynamics calculations, we calculate the far-infrared spectrum of amorphous silicon including the static polarization due to disorder. The peak positions as well as the magnitude of the absorption coefficient in the region of the bending modes agree with experiment. A random distribution of static charges leads to an infrared spectrum which merely reflects the vibrational density of states
Additional details
Publishing Information
- Journal Title
- Phys. Rev., B: Condens. Matter
- Journal Volume
- 34
- Journal Issue
- 4
- Series
- Phys. Rev., B: Condens. Matter.
- Journal Page Range
- 2402-2406
- ISSN
- 0163-1829
- CODEN
- PRBMD
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17087334
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABSORPTION SPECTRA; AMORPHOUS STATE; CHARGE DISTRIBUTION; ELECTRONIC STRUCTURE; ENERGY-LEVEL DENSITY; FAR INFRARED RADIATION; LATTICE VIBRATIONS; POLARIZATION; RANDOMNESS; SELF-CONSISTENT FIELD; SILICON
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; INFRARED RADIATION; RADIATIONS; SEMIMETALS; SPECTRA