Published September 14, 2007 | Version v1
Journal article

Chemical changes induced on a TiO2 surface by electron bombardment

  • 1. Laboratorio de Superficies e Interfaces, Instituto de Desarrollo Tecnologico para la Industria Quimica, INTEC (CONICET-UNL), Gueemes 3450, (S3000GLN) Santa Fe (Argentina)
  • 2. Departamento de Materiales, Facultad de Ingenieria Quimica, Universidad Nacional del Litoral, Santiago del Estero 2829, (S3000AOM) Santa Fe (Argentina)

Description

We study the TiO2 (Ti4+) chemical reduction induced by electron bombardment using Auger electron spectroscopy and factor analysis. We show that the electron irradiation of a TiO2 sample is characterized by the appearance of a lower Ti oxidation state, Ti2O3 (Ti3+), followed by a further deposition of carbon, which is present inevitably in the environment even under ultra-high vacuum conditions. The appearance of C over the surface is found to be a complex mechanism which affects the reduction process through passivation of the electron-induced oxygen desorption and formation of titanium carbide. For very high irradiation doses, we also found that the chemical changes on the surface are stopped due to the deposition of carbon in a graphitic form

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2007.04.031

Additional details

Identifiers

DOI
10.1016/j.tsf.2007.04.031;
PII
S0040-6090(07)00569-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
23
Journal Page Range
p. 8365-8370
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
5. international workshop on semiconductor gas sensors
Acronym
SGS 2006
Dates
10-13 Sep 2006
Place
Ustron (Poland)

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.