Gaussian beam profile shaping apparatus, method therefore and evaluation thereof
Description
A method and apparatus maps a Gaussian beam into a beam with a uniform irradiance profile by exploiting the Fourier transform properties of lenses. A phase element imparts a design phase onto an input beam and the output optical field from a lens is then the Fourier transform of the input beam and the phase function from the phase element. The phase element is selected in accordance with a dimensionless parameter which is dependent upon the radius of the incoming beam, the desired spot shape, the focal length of the lens and the wavelength of the input beam. This dimensionless parameter can also be used to evaluate the quality of a system. In order to control the radius of the incoming beam, optics such as a telescope can be employed. The size of the target spot and the focal length can be altered by exchanging the transform lens, but the dimensionless parameter will remain the same. The quality of the system, and hence the value of the dimensionless parameter, can be altered by exchanging the phase element. The dimensionless parameter provides design guidance, system evaluation, and indication as to how to improve a given system. 27 figs
Availability note (English)
Available from Patent and Trademark Office, Box 9, Washington, DC 20232 (United States)Additional details
Publishing Information
- Imprint Pagination
- [10 p.]
- IPC:
- Int. Cl. G02B 27/46; H01S 3/10; B23K 26/00
- IPC
- Int. Cl. G02B 27/46; H01S 3/10; B23K 26/00
- Patent number
- US patent document 5,864,430/A/
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 30031993
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- BEAM OPTICS; BEAM PROFILES; BEAM SHAPING; FOURIER TRANSFORMATION; LENSES; OPTICAL SYSTEMS
- Descriptors DEC
- INTEGRAL TRANSFORMATIONS; TRANSFORMATIONS
Optional Information
- Funding organization
- USDOE, Washington, DC (United States)
- Secondary number(s)
- US patent application 8-711,783