Published May 30, 2016 | Version v1
Journal article

Tuning and stabilizing topological insulator Bi2Se3 in the intrinsic regime by charge extraction with organic overlayers

  • 1. Department of Physics and Astronomy, The Johns Hopkins University, Baltimore, Maryland 21218 (United States)
  • 2. Department of Material Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218 (United States)
  • 3. Department of Material Science and Engineering, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (United States)
  • 4. Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (United States)

Description

In this work, we use charge extraction via organic overlayer deposition to lower the chemical potential of topological insulator (TI) Bi2Se3 thin films into the intrinsic (bulk-insulating) regime. We demonstrate the tuning and stabilization of intrinsic topological insulators at high mobility with low-cost organic films. With the protection of the organic charge extraction layers tetrafluorotetracyanoquinodimethane or tris(acetylacetonato)cobalt(III) (Co(acac)3), the sample is stable in the atmosphere with chemical potential ∼135 meV above the Dirac point (85 meV below the conduction band minimum, well within the topological insulator regime) after four months, which is an extraordinary level of environmental stability. The Co complex demonstrates the use of an organometallic for modulating TI charge density. The mobility of surface state electrons is enhanced as high as ∼2000 cm2/V s. Even at room temperature, a true topologically insulating state is realized and stabilized for months' exposure to the atmosphere.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
108
Journal Issue
22
Journal Page Range
vp.
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2016 Author(s)