Published October 1974
| Version v1
Book
Beam homogeneity and dependence of a Thomson ionic microetching machine on the variation in the working parameters
Description
The specific use of ion beam machining in selective etching of superposed thin films requires a rigourous control of the process. This control entails the two following requirements: a perfect etching uniformity on a large duty surface, an excellent reproducibility in etching velocities. Such performance can be obtained only from a systematic optimization study for the various discharge and neutralization parameters. Results obtained give information on the role and criticality of each of them, the mutual influences appearing at use, as well as improvements to be done
Abstract (French)
L'utilisation particuliere de l'usinage ionique par faisceau d'ions dans la gravure selective de couches minces superposees, exige un controle rigoureux de ce procede. Ce controle aboutit aux deux exigences suivantes: parfaite uniformite de gravure sur une grande surface utile, excellente reproductibilite des vitesses d'attaque. De telles performances ne peuvent etre obtenues que par une etude systematique d'optimisation des differents parametres de decharge et de neutralisation. Les resultats obtenus renseignent sur le role et la criticite de chacun d'eux, sur les influences mutuelles apparaissant a l'utilisation ainsi que sur les points a ameliorerAdditional details
Additional titles
- Original title (French)
- Homogeneite du faisceau et influence de la variation des differents parametres de fonctionnement sur l'utilisation d'un usineur ionique Thomson
Publishing Information
- Publisher
- Societe Francaise du Vide.
- Imprint Place
- Paris, France
- Imprint Title
- Electron and ion beam processes applications. 4. International congress AVISEM 74. Toulouse, October 8-11, 1974
- Imprint Pagination
- p. 270-277.
Conference
- Title
- 4. International congress AVISEM 74. Application of electronic and ionic processes.
- Dates
- 08 Oct 1974.
- Place
- Toulouse, France.
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 7242467
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRIC DISCHARGES; ETCHING; OPTIMIZATION; RECOMBINATION; SPUTTERING
- Descriptors DEC
- SURFACE FINISHING
Optional Information
- Notes
- Imprint:Supplement to the journal Le Vide les Couches Minces no. 171.;Application des processus electroniques et ioniques. 4. Congres international AVISEM 74. Toulouse, 8-11 Octobre 1974.