Published December 2018 | Version v1
Journal article Metadata-only

The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films

Creators

  • 1. Research and Production Company Fotron-Auto (Russian Federation)
  • 2. Moscow Technological University (MIREA) (Russian Federation)

Description

Advantages of fabricating precision optical coatings by magnetron sputtering with a gas discharge powered from a medium-frequency current-variation supply unit are considered. The significance of selecting optimal characteristics and operating modes of the power supply sources of the magnetron sputtering system (MSS) for fabrication of high-quality optical coatings is justified. Using the developed magnetron sputtering facility that comprises a multimode power supply unit of the MSS, samples with thin TiO2 films were fabricated at different recurrence frequencies fmag of the current pulses transmitted to the MSS and under other identical sputtering conditions. The samples were tested by laser ellipsometry, atomic force microscopy, X-ray diffractometry, and X-ray reflectometry. The influence of  fmag on the functional properties of the TiO2 films, namely, the refractive index, density, and roughness, is shown.

Additional details

Identifiers

DOI
10.1134/S0020168518150025;

Publishing Information

Journal Title
Inorganic Materials
Journal Volume
54
Journal Issue
15
Journal Page Range
p. 1491-1497
ISSN
0020-1685
CODEN
INOMAF

INIS

Country of Publication
Russian Federation
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51097335
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; COATINGS; DENSITY; DEPOSITS; ELLIPSOMETRY; FABRICATION; LASERS; MAGNETRONS; NANOCOMPOSITES; REFRACTIVE INDEX; ROUGHNESS; SPUTTERING; THIN FILMS; TITANIUM OXIDES; X RADIATION; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; IONIZING RADIATIONS; MATERIALS; MEASURING METHODS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NANOMATERIALS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SURFACE PROPERTIES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Copyright
Copyright (c) 2018 Pleiades Publishing, Inc.