Published October 1, 2009 | Version v1
Journal article

Arsenic doped p-type zinc oxide films grown by radio frequency magnetron sputtering

  • 1. Department of Physics, University of Hong Kong, Pokfulam Road (Hong Kong)
  • 2. Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay (Hong Kong)
  • 3. College of Physics and Microelectronic Science, Hunan University, Changsha 410082 (China)
  • 4. Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Dresden-Rossendorf, Postfach 510119, D-01314 Dresden (Germany)
  • 5. Institut fuer Strahlenphysik, Forschungszentrum Dresden-Rossendorf, Postfach 510119, D-01314 Dresden (Germany)

Description

As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate temperature during growth was raised above ∼400 deg. C, the films changed from n type to p type. Hole concentration and mobility of ∼6x1017 cm-3 and ∼6 cm2 V-1 s-1 were achieved. The ZnO films were studied by secondary ion mass spectroscopy, x-ray photoelectron spectroscopy (XPS), low temperature photoluminescence (PL), and positron annihilation spectroscopy (PAS). The results were consistent with the AsZn-2VZn shallow acceptor model proposed by Limpijumnong et al. [Phys. Rev. Lett. 92, 155504 (2004)]. The results of the XPS, PL, PAS, and thermal studies lead us to suggest a comprehensive picture of the As-related shallow acceptor formation.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
106
Journal Issue
7
Journal Page Range
p. 073709-073709.6
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2009 American Institute of Physics