Published May 2014 | Version v1
Journal article

Review on Se-and S-doped hydrogenated amorphous silicon thin film

  • 1. Department of Semiconductor Science, Dongguk University-Seoul, Jung-gu, Seoul 100-715 (Korea, Republic of)
  • 2. Republic of Korea 2School of Engineering and Technology, Sharda University, Knowledge Park-III, Greater Noida (India)

Description

Hydrogenated amorphous silicon thin films manufactured by plasma deposition techniques are widely used in electronic and optoelectronic devices. The optical and electrical properties of undoped and doped hydrogenated amorphous silicon (a-Si:H) thin films determine the importance and characteristics of the final film structure of practical devices. In particular, a-Si:H thin film solar cells and optical sensors have many industrial and technical advantages, such as being light weight, low cost, and having a large deposition area. The a-Si:H thin film is one of the candidates for flexible solar cells for use in space. This article reviews the optical and electrical properties of double donor Se-and S-doped a-Si:H thin films, which can be considered as an alternative to wide bandgap absorbing layers in the next generation of optoelectronic devices. (author)

Additional details

Publishing Information

Journal Title
Indian Journal of Pure and Applied Physics
Journal Volume
52
Journal Issue
5
Journal Page Range
p. 293-313
ISSN
0019-5596

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
52068003
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
AMORPHOUS STATE; COATINGS; CRYSTALLIZATION; DEPOSITION; DOPED MATERIALS; SELENIUM; SUBSTRATES; SULFUR; THIN FILMS
Descriptors DEC
ELEMENTS; FILMS; MATERIALS; NONMETALS; PHASE TRANSFORMATIONS; SEMIMETALS