Published 1989
| Version v1
Book
Laser-based semiconductor fabrication
Creators
- 1. Los Alamos National Lab., NM (USA). Materials Science and Technology Div.
Description
This paper discusses research that has concentrated on methods for direct processing of integrated circuits (IC's), such as defect reduction in epitaxial silicon, large grain polysilicon growth, laser-assisted etching and film deposition methods, and removal of dislocation networks
Additional details
Publishing Information
- Publisher
- Marcel Dekker Inc.
- Imprint Place
- New York, NY (USA)
- ISBN
- 0-8247-8078-7
- Imprint Title
- Laser-induced plasmas and applications
- Imprint Pagination
- 440 p.
- Journal Page Range
- p. 269-294.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 21084627
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Descriptors DEI
- EPITAXY; ETCHING; FABRICATION; GRAIN ORIENTATION; INTEGRATED CIRCUITS; LASER-PRODUCED PLASMA; RESEARCH PROGRAMS; SILICON; THIN FILMS
- Descriptors DEC
- CRYSTAL STRUCTURE; ELECTRONIC CIRCUITS; ELEMENTS; FILMS; MICROSTRUCTURE; ORIENTATION; PLASMA; SEMIMETALS