Published July 1999
| Version v1
Journal article
Electron interactions with plasma processing gases: An update for CF4, CHF3, C2F6, and C3F8
Creators
- 1. Electricity Division, Electronics and Electrical Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899-8113 (United States)
Description
An update of electron-collision cross sections and electron transport parameters is presented for CF4, CHF3, C2F6, and C3F8
Additional details
Identifiers
- DOI
- 10.1063/1.556042;
- PII
- S0047-2689(99)00104-X;
Publishing Information
- Journal Title
- Journal of Physical and Chemical Reference Data
- Journal Volume
- 28
- Journal Issue
- 4
- Journal Page Range
- p. 967-982
- ISSN
- 0047-2689
- CODEN
- JPCRBU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35051567
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CARBON TETRAFLUORIDE; CHARGED-PARTICLE TRANSPORT; CROSS SECTIONS; DISLOCATIONS; ELECTRON MOBILITY; FLUORINATED ALIPHATIC HYDROCARBONS; FLUOROFORM; IONIZATION; ORGANIC COMPOUNDS; PLASMA
- Descriptors DEC
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; FLUORINATED ALIPHATIC HYDROCARBONS; HALOGENATED ALIPHATIC HYDROCARBONS; LINE DEFECTS; MOBILITY; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; PARTICLE MOBILITY; RADIATION TRANSPORT
Optional Information
- Notes
- (c) 1999 American Institute of Physics and American Chemical Society.