Published November 1982
| Version v1
Journal article
Diffusion of Au into Sn thin films studied by the attenuated total reflection method
Creators
- 1. Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
Description
The diffusion of Au into Sn thin films has been measured from 20 to 40 0C. Diffusion rates were determined using the method of attenuated total reflection which measures the absorption resonance in the reflection spectrum caused by plasmon excitation on the dielectric-metal interface. By observing the incident angle at which the reflection is a minimum, the thickness of the unreacted Au layer can be determined, and thus the thickness of the alloy phase in each stage can be calculated. The diffusion rate at 20 0C is found to be D = 1.9 x 10-14 cm2 s-1, and the activation energy for the formation of AuSn is 22.6 kcal/mole
Additional details
Publishing Information
- Journal Title
- J. Appl. Phys.
- Journal Volume
- 53
- Journal Issue
- 11
- Series
- J. Appl. Phys.
- Journal Page Range
- 7362-7366
- ISSN
- 0021-8979
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 14741324
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ABSORPTION; ACTIVATION ENERGY; ALLOYS; ATOM TRANSPORT; ATTENUATION; DIELECTRIC MATERIALS; DIFFUSION; EXCITATION; EXPERIMENTAL DATA; FILMS; GOLD; INTERFACES; MEDIUM TEMPERATURE; REFLECTION; RESONANCE; SPECTRA; THICKNESS; TIN
- Descriptors DEC
- DATA; DIMENSIONS; ELEMENTS; ENERGY; ENERGY-LEVEL TRANSITIONS; INFORMATION; MATERIALS; METALS; NEUTRAL-PARTICLE TRANSPORT; NUMERICAL DATA; RADIATION TRANSPORT; TRANSITION ELEMENTS