Published November 1982 | Version v1
Journal article

Diffusion of Au into Sn thin films studied by the attenuated total reflection method

  • 1. Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830

Description

The diffusion of Au into Sn thin films has been measured from 20 to 40 0C. Diffusion rates were determined using the method of attenuated total reflection which measures the absorption resonance in the reflection spectrum caused by plasmon excitation on the dielectric-metal interface. By observing the incident angle at which the reflection is a minimum, the thickness of the unreacted Au layer can be determined, and thus the thickness of the alloy phase in each stage can be calculated. The diffusion rate at 20 0C is found to be D = 1.9 x 10-14 cm2 s-1, and the activation energy for the formation of AuSn is 22.6 kcal/mole

Additional details

Publishing Information

Journal Title
J. Appl. Phys.
Journal Volume
53
Journal Issue
11
Series
J. Appl. Phys.
Journal Page Range
7362-7366
ISSN
0021-8979

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
14741324
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ABSORPTION; ACTIVATION ENERGY; ALLOYS; ATOM TRANSPORT; ATTENUATION; DIELECTRIC MATERIALS; DIFFUSION; EXCITATION; EXPERIMENTAL DATA; FILMS; GOLD; INTERFACES; MEDIUM TEMPERATURE; REFLECTION; RESONANCE; SPECTRA; THICKNESS; TIN
Descriptors DEC
DATA; DIMENSIONS; ELEMENTS; ENERGY; ENERGY-LEVEL TRANSITIONS; INFORMATION; MATERIALS; METALS; NEUTRAL-PARTICLE TRANSPORT; NUMERICAL DATA; RADIATION TRANSPORT; TRANSITION ELEMENTS