Published August 2005 | Version v1
Journal article

ECR multi-charged ion source directly excited in a circular TE01 mode cavity resonator

  • 1. Department of Electronics and Informatics, Toyama Pref. University, 5180 Kurokawa, Kosugi, Toyama 939-0398 (Japan)
  • 2. Tateyama Machine Co., Ltd., 30 Shimonoban, Oyama, Toyama 930-1305 (Japan)

Description

A new concept is proposed for enhancing the efficiency of an electron cyclotron resonance (ECR) plasma for production of multi-charged ions (TAIKOII). The plasma chamber is a circular cavity resonator with two metal plates. A fixed plate is installed at the tip of the ion extractor. The distance between the fixed plate and the antenna installed at the side wall is equal to a quarter of the guided wavelength λ g for the circular TE01 mode microwave. A mobile plate is inserted from the opposite side along the geometrical axis to tune the microwave. Excitation of single TE01 mode has been confirmed. The electric field has only a circumferential component and is axially symmetric in the same direction as electron cyclotron motion. The peak value of the electric field is located at the ECR zone. Multi-charged ions are extracted by a voltage of 10 kV and the charge state distribution (CSD) of their ion currents are measured by using the sector magnet and the faraday cap. The extracted Ar4+ ion current changes periodically when the mobile plate moves in the plasma and the interval of the mobile and the fixed plates is several times λ g/2 in the TE01 mode microwaves. We present and discuss production of multi-charged ions by applying the TE01 mode microwave in order to enhance efficiency of the ECR in the optimized magnetic field

Additional details

Identifiers

DOI
10.1016/j.nimb.2004.12.141;
PII
S0168-583X(05)00682-8;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
237
Journal Issue
1-2
Journal Page Range
p. 256-261
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
15. international conference on ion implantation technology
Dates
25-27 Oct 2004
Place
Taipei, Taiwan (China)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.