Dopant atoms as quantum components in silicon nanoscale devices
Creators
- 1. Engineering Research Center for Semiconductor Integrated Technology, Beijing Engineering Center of Semiconductor Micro-Nano Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
Description
Recent progress in nanoscale fabrication allows many fundamental studies of the few dopant atoms in various semiconductor nanostructures. Since the size of nanoscale devices has touched the limit of the nature, a single dopant atom may dominate the performance of the device. Besides, the quantum computing considered as a future choice beyond Moore's law also utilizes dopant atoms as functional units. Therefore, the dopant atoms will play a significant role in the future novel nanoscale devices. This review focuses on the study of few dopant atoms as quantum components in silicon nanoscale device. The control of the number of dopant atoms and unique quantum transport characteristics induced by dopant atoms are presented. It can be predicted that the development of nanoelectronics based on dopant atoms will pave the way for new possibilities in quantum electronics. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/39/6/061003Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 39
- Journal Issue
- 6
- Journal Page Range
- [8 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51067288
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ATOMS; CONTROL; DOPED MATERIALS; EQUIPMENT; FABRICATION; NANOELECTRONICS; NANOSTRUCTURES; PERFORMANCE; QUANTUM COMPUTERS; QUANTUM ELECTRONICS; REVIEWS; SEMICONDUCTOR MATERIALS; SILICON
- Descriptors DEC
- COMPUTERS; DOCUMENT TYPES; ELEMENTS; MATERIALS; SEMIMETALS