Published June 1, 2018 | Version v1
Journal article

Dopant atoms as quantum components in silicon nanoscale devices

  • 1. Engineering Research Center for Semiconductor Integrated Technology, Beijing Engineering Center of Semiconductor Micro-Nano Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

Recent progress in nanoscale fabrication allows many fundamental studies of the few dopant atoms in various semiconductor nanostructures. Since the size of nanoscale devices has touched the limit of the nature, a single dopant atom may dominate the performance of the device. Besides, the quantum computing considered as a future choice beyond Moore's law also utilizes dopant atoms as functional units. Therefore, the dopant atoms will play a significant role in the future novel nanoscale devices. This review focuses on the study of few dopant atoms as quantum components in silicon nanoscale device. The control of the number of dopant atoms and unique quantum transport characteristics induced by dopant atoms are presented. It can be predicted that the development of nanoelectronics based on dopant atoms will pave the way for new possibilities in quantum electronics. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/39/6/061003

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
39
Journal Issue
6
Journal Page Range
[8 p.]
ISSN
1674-4926

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51067288
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMS; CONTROL; DOPED MATERIALS; EQUIPMENT; FABRICATION; NANOELECTRONICS; NANOSTRUCTURES; PERFORMANCE; QUANTUM COMPUTERS; QUANTUM ELECTRONICS; REVIEWS; SEMICONDUCTOR MATERIALS; SILICON
Descriptors DEC
COMPUTERS; DOCUMENT TYPES; ELEMENTS; MATERIALS; SEMIMETALS