Published April 1992
| Version v1
Journal article
Gaseous phase deposition as a new process for obtaining products and coatings of refractory metals
Creators
Description
Physic-and-chemical foundations are generalized of heterogenious reduction of gaseous fluorides of refractory metals by means of hydrogen. It is shown that in reduction of fluorides of tungsten and tantalum the intermediate fluorides would not render notable influence on forming obtained precipitations while in reduction of molibdenum and niobium their action is very substantial
Additional details
Additional titles
- Original title (Russian)
- Газофазное осаждение - новый технологический процесс для получения изделий и покрытий из тугоплавких металлов
Publishing Information
- Journal Title
- Tsvetnye Metally
- Journal Issue
- no.4
- Journal Page Range
- p. 43-47.
- ISSN
- 0372-2929
- CODEN
- TVMTAX
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- Russian Federation
- INIS RN
- 25013939
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; FLUORIDES; HYDROGEN; MICROSTRUCTURE; MOLYBDENUM; NIOBIUM; REACTION KINETICS; REDUCTION; TANTALUM; TUNGSTEN; VAPOR DEPOSITED COATINGS
- Descriptors DEC
- CHEMICAL COATING; CHEMICAL REACTIONS; COATINGS; CRYSTAL STRUCTURE; DEPOSITION; ELEMENTS; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; KINETICS; METALS; NONMETALS; SURFACE COATING; TRANSITION ELEMENTS