Published June 30, 2016 | Version v1
Journal article

Nanoparticles based laser-induced surface structures formation on mesoporous silicon by picosecond laser beam interaction

  • 1. GREMI, UMR 7344 CNRS-Université Orléans, 45067 Orléans Cedex 2 (France)
  • 2. Université François Rabelais de Tours, CNRS, CEA, INSA-CVL, GREMAN UMR 7347, Tours (France)

Description

Highlights: • Continuous evolution of morphology surface of MeP-Si from random nanoparticles distribution of SiOx to Nps-based LSFL. • Surface modulation phenomenon including Nps as formation process of LIPSS. • Liquid phase in the vicinity of the LIPSS area. - Abstract: In this study, laser induced periodic surface structures were formed on mesoporous silicon by irradiation of Nd:YAG picosecond pulsed laser beam at 266 nm wavelength at 1 Hz repetition rate and with 42 ps pulse duration. The effects of laser processing parameters as laser beam fluence and laser pulse number on the formation of ripples were investigated. Scanning electron microscopy and atomic force microscopy were used to image the surface morphologies and the cross section of samples after laser irradiation. At relatively low fluence ∼20 mJ/cm2, ripples with period close to the laser beam wavelength (266 nm) and with an always controlled orientation (perpendicular to the polarization of ps laser beam) appeared after a large laser pulse number of 12,000. It has been found that an initial random distribution of SiOx nanoparticles is periodically structured with an increase of the laser pulse number. Finally, it is experimentally demonstrated that we formed a 100 nm liquid phase under the protusion zones including the pores in the picosecond regime.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2015.09.003

Additional details

Identifiers

DOI
10.1016/j.apsusc.2015.09.003;
PII
S0169-4332(15)02094-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
374
Journal Page Range
p. 31-35
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
Laser and plasma processing for advanced applications in material science
Acronym
E-MRS 2015 spring meeting symposium CC
Dates
11-15 May 2015
Place
Lille (France)

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.