Published May 1989
| Version v1
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The beam emittance of negative ion sources
Description
A computer controlled emittance meter has been used to measure the emittance of various beams produced by the three ion sources installed at the Strasbourg Tandem injector: the direct extraction duoplasmatron source, the penning source and the cesium sputter ion source (model 860). The RMS emittance and the emittance enclosing 90% of the beam intensity were extracted and compared. The shape of emittance contours and the fractional intensity emittance were analyzed. For the three sources, an emittance value smaller than 5π.mm.mrad.MeV1/2 was found for a beam intensity ranging from 500 to 2500 nA
Availability note (English)
MF available from INIS under the Report Number.Files
22016473.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 10 p.
- Report number
- CRN-VIV--72
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 22016473
- Subject category
- S43: PARTICLE ACCELERATORS; S43: PARTICLE ACCELERATORS;
- Descriptors DEI
- ACCELERATOR FACILITIES; BEAM EMITTANCE; BEAM EXTRACTION; BEAM MONITORING; BEAM OPTICS; BEAM PROFILES; CESIUM IONS; DUOPLASMATRONS; ION BEAM INJECTION; ION BEAMS; ION SOURCES; PENNING ION SOURCES; SPUTTERING
- Descriptors DEC
- ATOMIC IONS; BEAM INJECTION; BEAMS; CHARGED PARTICLES; ELECTRON TUBES; IONS; MONITORING; PLASMATRONS