Published October 1988 | Version v1
Journal article

A study on the thermal analysis of hydrogenated amorphous carbon produced by plasma-assisted chemical vapor deposition

  • 1. Korea Advanced Inst. of Science and Technology, Seoul (Republic of Korea)

Description

Hydrogenated amorphous carbon (a-C:H) films prepared by plasma-assisted chemical vapor deposition of C3H8-Ar are studied by thermal analysis by using gas chromatography (GC) and differential scanning calorimetry(DSC) at constant heating rate and Ar atmosphere. Hydrogen evolution is detected by GC above 380deg C and the evolution rate increases with temperature up to 700deg C. Corresponding to the hydrogen evolution exothermic reaction appears in the DSC curve followed by a sudden conversion into endothermic reaction at higher temperature. The starting points of endothermic reactions on the DSC curves are raised by the temperature and time of the prior heat treatments. It is considered that during heating the overall structural changes, including C-H bond breaking, H2 formation, C=C double bond formation and network distortion etc., occur consecutively, irreversibly and endothermically and the initial exothermic reaction is due to the evolution of hydrogen weakely bound during cooling or the structural relaxation. (Author)

Additional details

Publishing Information

Journal Title
Journal of the Korean Institute of Metals
Journal Volume
26
Journal Issue
10
Series
J. Korean Inst. Met.
Journal Page Range
929-938
CODEN
KUHCA

INIS

Country of Publication
Korea, Republic of
Country of Input or Organization
Korea, Republic of
INIS RN
21031062
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CARBON; CHEMICAL VAPOR DEPOSITION; COATINGS; FILMS; GAS CHROMATOGRAPHY; PLASMA; THERMAL ANALYSIS
Descriptors DEC
CHEMICAL COATING; CHROMATOGRAPHY; DEPOSITION; ELEMENTS; NONMETALS; SEPARATION PROCESSES; SURFACE COATING