Published December 16, 2013 | Version v1
Journal article

Impact of transparent electrode on photoresponse of ZnO-based phototransistor

  • 1. Advanced Device Laboratory, Samsung Advanced Institute of Technology, Samsung Electronics Corporation, Yongin-Si, Gyeonggi-Do 446-712 (Korea, Republic of)
  • 2. Department of Display and Semiconductor Physics and Department of Applied Physics, Korea University, 2511, Sejongro, Sejong, 339–700 (Korea, Republic of)
  • 3. Analytical Science Group, Samsung Advanced Institute of Technology, Samsung Electronics Corporation, Yongin-Si, Gyeonggi-Do 446-712 (Korea, Republic of)

Description

ZnO-based photo-thin film transistors with enhanced photoresponse were developed using transparent conductive oxide contacts. Changing the electrode from opaque Mo to transparent In-Zn-O increases the photocurrent by five orders of magnitude. By changing the opacity of each source and drain electrode, we could observe how the photoresponse is affected. We deduce that the photocurrent generation mechanism is based on an energy band change due to the photon irradiation. More importantly, we reveal that the photocurrent is determined by the energy barrier of injected electrons at the interface between the source electrode and the active layer

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
103
Journal Issue
25
Journal Page Range
p. 251111-251111.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45074882
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ELECTRODES; ELECTRONS; IRRADIATION; OPACITY; PHOTONS; THIN FILMS; TRANSISTORS; ZINC OXIDES
Descriptors DEC
BOSONS; CHALCOGENIDES; ELEMENTARY PARTICLES; FERMIONS; FILMS; LEPTONS; MASSLESS PARTICLES; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; ZINC COMPOUNDS

Optional Information

Notes
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