Published December 1, 2009 | Version v1
Journal article

Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units

  • 1. JST, CREST (Japan)
  • 2. Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047 (Japan)
  • 3. EMD Corporation, 1-36, Goryoohara-cho, Nishikyo-ku, Kyoto 615-8245 (Japan)
  • 4. Department of Electronics, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395 (Japan)
  • 5. Plasma Nanotechnology Research Center, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
  • 6. Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198 Japan (Japan)
  • 7. Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

Description

Plasma surface treatment of polymers has been carried out with argon/oxygen mixture plasmas driven by multiple low-inductance antenna units. Kinetic energy distribution of argon ions from the argon/oxygen mixture plasmas onto polymers showed considerable suppression of ion energies sufficiently less than 10 eV. Polyethyleneterephthalate (PET) films were exposed to argon/oxygen mixture plasma for 1-5 min on a water-cooled substrate holder. The etching depth of PET surface increased with increasing plasma-exposure time and the etching rate was 118 nm/min. Surface roughness of PET surface (root-mean-square value) increased from 0.5 nm to 2.7 nm with increasing plasma-exposure time from 0 min (original sample) to 5 min. Hard X-ray photoelectron spectroscopy (HXPES) was carried out for analysis of chemical bonding states of the PET surface. The HXPES analyses exhibited nano-surface modification of the PET surface without suffering degradation of molecular structures beneath.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2009.07.161

Additional details

Identifiers

DOI
10.1016/j.tsf.2009.07.161;
PII
S0040-6090(09)01298-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
518
Journal Issue
3
Journal Page Range
p. 1006-1011
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
21. symposium on plasma science for materials
Dates
8-11 Oct 2008
Place
Huangshan (China)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.