Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units
Creators
- 1. JST, CREST (Japan)
- 2. Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047 (Japan)
- 3. EMD Corporation, 1-36, Goryoohara-cho, Nishikyo-ku, Kyoto 615-8245 (Japan)
- 4. Department of Electronics, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395 (Japan)
- 5. Plasma Nanotechnology Research Center, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
- 6. Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198 Japan (Japan)
- 7. Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
Description
Plasma surface treatment of polymers has been carried out with argon/oxygen mixture plasmas driven by multiple low-inductance antenna units. Kinetic energy distribution of argon ions from the argon/oxygen mixture plasmas onto polymers showed considerable suppression of ion energies sufficiently less than 10 eV. Polyethyleneterephthalate (PET) films were exposed to argon/oxygen mixture plasma for 1-5 min on a water-cooled substrate holder. The etching depth of PET surface increased with increasing plasma-exposure time and the etching rate was 118 nm/min. Surface roughness of PET surface (root-mean-square value) increased from 0.5 nm to 2.7 nm with increasing plasma-exposure time from 0 min (original sample) to 5 min. Hard X-ray photoelectron spectroscopy (HXPES) was carried out for analysis of chemical bonding states of the PET surface. The HXPES analyses exhibited nano-surface modification of the PET surface without suffering degradation of molecular structures beneath.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2009.07.161Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2009.07.161;
- PII
- S0040-6090(09)01298-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 518
- Journal Issue
- 3
- Journal Page Range
- p. 1006-1011
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 21. symposium on plasma science for materials
- Dates
- 8-11 Oct 2008
- Place
- Huangshan (China)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42054985
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; ARGON IONS; CHEMICAL BONDS; ETCHING; EV RANGE 01-10; HARD X RADIATION; INDUCTANCE; KINETIC ENERGY; MOLECULAR STRUCTURE; ORGANIC POLYMERS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA; SURFACE TREATMENTS; SURFACES; THIN FILMS
- Descriptors DEC
- CHARGED PARTICLES; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; ENERGY RANGE; EV RANGE; FILMS; FLUIDS; GASES; IONIZING RADIATIONS; IONS; NONMETALS; ORGANIC COMPOUNDS; PHYSICAL PROPERTIES; POLYMERS; RADIATIONS; RARE GASES; SPECTROSCOPY; SURFACE FINISHING; X RADIATION
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.