Selection of pulsed laser deposition conditions for preparation of perfect thin-film MoS_x hydrogen evolution catalysts

The influence of pulsed laser deposition conditions in the geometry "off-axis" on the catalytic properties of MoS_x films in the hydrogen evolution reaction is investigated. For the deposition of MoS_x films from MoS₂ target, pulsed laser radiation from the IR and UV wavelength ranges was used. The angle of incidence of the laser-induced plume on the surface of the substrate in a buffer gas was varied to check the influence of large in-size Mo-enriched particles. The efficiency of the catalyst was estimated from the results of the turnover frequency (TOF) measurement, which made it possible to minimize the influence of the "loading" of the catalyst on its characteristics. The effects of the chemical composition, local structure, and properties of the catalyst–substrate interface on the efficiency of the hydrogen evolution reaction are analysed. The regime of pulsed laser deposition of more effective thin-film MoS_x catalysts is determined. (paper)