Published September 15, 2004 | Version v1
Journal article

Electrical characteristics of molybdenum Schottky contacts on n-type GaN

  • 1. Department of Electronics, Post-Graduate Centre, University of Mysore, Hemagangotri, 573220 Hassan (India)
  • 2. Analytical Engineering Center, Samsung Advanced Institute of Technology (SAIT), P.O. Box 111, Suwon 440-600 (Korea, Republic of)

Description

The Schottky barrier heights of molybdenum (Mo) on n-GaN were investigated as a function of annealing temperature by current-voltage (I-V) and capacitance-voltage (C-V) techniques. The Schottky barrier height of the as-deposited Mo/n-GaN was found to be 0.81 eV (I-V) and 1.02 eV (C-V), respectively. However, both measurements indicate that the barrier height slightly decreases upon annealing at 400 deg. C for 1 min in nitrogen ambient. The barrier height of Mo/n-GaN Schottky contacts at 400 deg. C was determined to be 0.74 and 0.92 eV, respectively. Further, an increase in annealing temperature up to 600 deg. C, decreased the barrier height to 0.56 and 0.73 eV. The Mo Schottky contact was also shown to be fairly stable during annealing at 400 deg. C

Additional details

Identifiers

DOI
10.1016/j.mseb.2004.05.005;
PII
S0921-5107(04)00208-9;

Publishing Information

Journal Title
Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
Journal Volume
112
Journal Issue
1
Journal Page Range
p. 30-33
ISSN
0921-5107
CODEN
MSBTEK

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.