Published November 1986
| Version v1
Journal article
Electrical properties and microstructures of hot-pressed silicon nitride
Creators
- 1. Japan Atomic Energy Research Inst., Tokai, Ibaraki. Dept. of Fuels and Materials Research
Description
The electrical conductivity of a hot-pressed Si3N4 with additivies of Al2O3 and Y2O3 was measured at temperatures between 580 and 10000C, and at frequencies between 5Hz and 1 MHz. The ac conductivity approached about 3x10-6/Ωcm at 10000C and decreased with decreasing temperature to a minimum in the conductivity. The temperature of the minimum conductivity increased with the frequency. The activation energy of the dc volume conductivity was 101 kJ/mol for the high temperature region above 7500C and 54kJ/mol below 7500C. Although Y and Al in additives were observed to stay at the multiple-grain junction region in an as-received sample, they were distributed in the Si3N4 grain after being heated at 8250C for 3 h. (orig.)
Additional details
Publishing Information
- Journal Title
- J. Nucl. Mater.
- Journal Volume
- 141-143
- Journal Issue
- pt.A
- Series
- J. Nucl. Mater.
- Journal Page Range
- 396-400
- ISSN
- 0022-3115
- CODEN
- JNUMA
Conference
- Title
- 2. international conference on fusion reactor materials (ICFRM-2).
- Dates
- 13-17 Apr 1986.
- Place
- Chicago, IL (USA).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 18071149
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, Numerical Data
- Descriptors DEI
- ACTIVATION ENERGY; ADDITIVES; ALUMINIUM OXIDES; CHEMICAL COMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRICAL INSULATORS; EXPERIMENTAL DATA; FREQUENCY DEPENDENCE; HIGH TEMPERATURE; HOT PRESSING; IMPEDANCE; MICROSTRUCTURE; SILICON NITRIDES; TEMPERATURE DEPENDENCE; THERMONUCLEAR REACTOR MATERIAL; TRANSMISSION ELECTRON MICROSCO; VERY HIGH TEMPERATURE; X-RAY DIFFRACTION; X-RAY EMISSION ANALYSIS; YTTRIUM OXIDES
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHEMICAL ANALYSIS; COHERENT SCATTERING; CRYSTAL STRUCTURE; DATA; DIFFRACTION; ELECTRICAL EQUIPMENT; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; ENERGY; EQUIPMENT; FABRICATION; INFORMATION; MATERIALS; MATERIALS WORKING; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; NONDESTRUCTIVE ANALYSIS; NUMERICAL DATA; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PRESSING; SCATTERING; SILICON COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS