Published July 1, 2012 | Version v1
Journal article

A different approach for determining the responsivity of n+p detectors using scanning electron microscopy

  • 1. Department of Information Technology and Media, Mid Sweden University, Holmgatan 10, SE-851 70, Sundsvall (Sweden)

Description

This paper explores an alternative to the standard method of studying the responsivities (the input—output gain) and other behaviours of detectors at low electron energy. The research does not aim to compare the results of differently doped n+p detectors; its purpose is to provide an alternative characterization method (using scanning electron microscopy) to those used in previous studies on the responsivity of n+p doped detectors as a function of the electron radiation energy and other interface parameters. (semiconductor devices)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/33/7/074002

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
33
Journal Issue
7
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43107835
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DOPED MATERIALS; ELECTRONS; INTERFACES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES; STANDARDS
Descriptors DEC
ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MATERIALS; MICROSCOPY