Published July 1, 2012
| Version v1
Journal article
A different approach for determining the responsivity of n+p detectors using scanning electron microscopy
- 1. Department of Information Technology and Media, Mid Sweden University, Holmgatan 10, SE-851 70, Sundsvall (Sweden)
Description
This paper explores an alternative to the standard method of studying the responsivities (the input—output gain) and other behaviours of detectors at low electron energy. The research does not aim to compare the results of differently doped n+p detectors; its purpose is to provide an alternative characterization method (using scanning electron microscopy) to those used in previous studies on the responsivity of n+p doped detectors as a function of the electron radiation energy and other interface parameters. (semiconductor devices)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/33/7/074002Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 33
- Journal Issue
- 7
- Journal Page Range
- [5 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43107835
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; ELECTRONS; INTERFACES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES; STANDARDS
- Descriptors DEC
- ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MATERIALS; MICROSCOPY