Published February 1, 2018 | Version v1
Journal article

Characteristic modification by inserted metal layer and interface graphene layer in ZnO-based resistive switching structures

  • 1. School of Physics, Beijing Institute of Technology, Beijing 100081 (China)
  • 2. Elementary Educational College, Beijing Key Laboratory for Nano-Photonics and Nano-Structure, Capital Normal University, Beijing 100048 (China)

Description

ZnO-based resistive switching device Ag/ZnO/TiN, and its modified structure Ag/ZnO/Zn/ZnO/TiN and Ag/graphene/ZnO/TiN, were prepared. The effects of inserted Zn layers in ZnO matrix and an interface graphene layer on resistive switching characteristics were studied. It is found that metal ions, oxygen vacancies, and interface are involved in the RS process. A thin inserted Zn layer can increase the resistance of HRS and enhance the resistance ratio. A graphene interface layer between ZnO layer and top electrode can block the carrier transport and enhance the resistance ratio to several times. The results suggest feasible routes to tailor the resistive switching performance of ZnO-based structure. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/27/2/027104

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
27
Journal Issue
2
Journal Page Range
[5 p.]
ISSN
1674-1056