Published January 15, 2016 | Version v1
Journal article

First-principles study of the origin of magnetism induced by intrinsic defects in monolayer MoS2

  • 1. College of Sciences, China Jiliang University, Hangzhou 310018 (China)
  • 2. College of Optical and Electronic Technology, China Jiliang University, Hangzhou 310018 (China)
  • 3. School of Physics and Microelectronics science, Hunan university, Changsha 410082, Hunan (China)

Description

Highlights: • Mo absorption and Mo substituted at S site induce the magnetism. • The origin of the magnetism is mainly from the Mo adatom and substitutional atom. • SMo and VMo realize the n-type and p-type semiconductor behavior, respectively. - Abstract: The structural, electronic and magnetic properties of intrinsic defects in monolayer MoS2 have investigated systematically by first-principles calculations based on density functional theory. The results show that S vacancy and S adsorption is the most favorable intrinsic defect under Mo-rich and S-rich conditions, respectively. Mo atom adsorbed on monolayer MoS2 and Mo atom substituted at S site induced the spin-polarization, which gives rise to total magnetic moment of 4.0μB and 2.0μB, respectively. The magnetism is mainly origin from the Mo adatom and the Mo substitutional atom, respectively. For the Mo and S adsorption, the Mo atom and S atom prefer to adsorb on top of the Mo atom and the S atom, respectively. In addition, SMo and VMo can realize the n-type and p-type semiconductor behavior, respectively. These predictions are useful for the spintronic devices designs.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2015.11.134

Additional details

Identifiers

DOI
10.1016/j.apsusc.2015.11.134;
PII
S0169-4332(15)02831-7;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
361
Journal Page Range
p. 199-205
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.