Synthesis and laser annealing of embedded CdSe-nanoparticles in SiO2 by pulsed excimer laser radiation
Creators
- 1. Institut fuer Physik, Universitaet Augsburg, D-86135 Augsburg (Germany)
Description
CdSe-semiconductor nanocrystals embedded in SiO2 on silicon have been synthesized by ion implantation of Cd+ and Se+ followed by pulsed excimer laser annealing at room temperature. Transmission electron microscopy and x-ray diffraction-analysis results suggest that wurzite-type embedded CdSe nanocrystals have been formed. Since laser annealing can be applied locally this opens a route towards spatially selective annealing. In a second type of experiment pulsed laser annealing was performed on embedded CdSe nanoparticles synthesized by standard thermal annealing resulting in oriented ellipsoidal deformation and morphological changes of the larger precipitates. Computer simulation results suggest a size-selective temperature increase of the CdSe nanocrystals as the underlying mechanism
Additional details
Identifiers
- DOI
- 10.1063/1.2205721;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 88
- Journal Issue
- 20
- Journal Page Range
- p. 203123-203123.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37083611
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; CADMIUM IONS; CADMIUM SELENIDES; COMPUTERIZED SIMULATION; DEFORMATION; EXCIMER LASERS; ION IMPLANTATION; MORPHOLOGICAL CHANGES; NANOSTRUCTURES; PARTICLES; SELENIUM IONS; SEMICONDUCTOR MATERIALS; SILICON; SILICON OXIDES; SYNTHESIS; TEMPERATURE RANGE 0273-0400 K; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CADMIUM COMPOUNDS; CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; GAS LASERS; HEAT TREATMENTS; IONS; LASERS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SELENIDES; SELENIUM COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS; SIMULATION; TEMPERATURE RANGE
Optional Information
- Notes
- (c) 2006 American Institute of Physics