Published January 1995
| Version v1
Journal article
Multiple-charged secondary-ion emission from silicon and silicon oxide bombarded by heavy ions at energies of 0.4--10 MeV
- 1. Department of Nuclear Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-01 (Japan)
Description
Secondary-ion yields have been measured for Si and SiO2 targets bombarded by C, Si, Ge, and Ag projectiles over an energy range beween 0.4 and 10 MeV, where the atomic-collision process changes from a nuclear to an electronic one. Obtained yields of secondary Siq+ (q=1,2,3,4) ions for the C projectiles are generally decreasing functions of incident energy. On the other hand, the yields for Ag increase with increasing energy except for Si+. The possibility of multiple-charged recoil-ion production through the simultaneous process of ionization and recoil caused by the projectiles is discussed on the basis of an independent-electron model, which describes multiple ionization of atoms by energetic heavy-ion impact
Additional details
Publishing Information
- Journal Title
- Physical Review. A
- Journal Volume
- 51
- Journal Issue
- 1
- Journal Page Range
- p. 554-560.
- ISSN
- 1050-2947
- CODEN
- PLRAAN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26036144
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- HEAVY IONS; ION COLLISIONS; ION EMISSION; KEV RANGE 100-1000; MEV RANGE 01-10; MULTICHARGED IONS; SECONDARY EMISSION; SILICON; SILICON OXIDES; SOLIDS
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; COLLISIONS; ELEMENTS; EMISSION; ENERGY RANGE; IONS; KEV RANGE; MEV RANGE; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS