Published October 1980
| Version v1
Journal article
Interferrometer focussing accuracy and the effect on interferograms for density measurements of laser produced plasmas
Description
Computer simulations have been made of interferograms produced in a typical short pulse laser produced plasma experiment. It is shown that interferometer focussing accuracy becomes increasingly critical as the plasma profile steepening becomes stringer and that there is a corresponding decrease in the maximum electron density that can be probed. (orig.)
Additional details
Publishing Information
- Journal Title
- Opt. Commun.
- Journal Volume
- 35
- Journal Issue
- 1
- Series
- Opt. Commun.
- Journal Page Range
- 127-132
- ISSN
- 0030-4018
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 12590133
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- COMPUTERIZED SIMULATION; ELECTRON DENSITY; INTERFEROMETERS; LASER-PRODUCED PLASMA; MEASURING METHODS; PULSES
- Descriptors DEC
- MEASURING INSTRUMENTS; PLASMA; SIMULATION